METHOD FOR DEVELOPING PHOTO MASKING AND APPARATUS THEREOF

摘要

PURPOSE: A method for developing a photo masking is provided which can obtain a uniform pattern on a wafer by dissolving a selected PR(photoresist) completely on the wafer. CONSTITUTION: A developing facility of a photo masking process includes: a spin chuck(20) having a turn table(22) on whose top a semiconductor wafer(40) where patterns are formed is placed; a part depositing a developer(44) on the top surface of the wafer placed on the turn table of the spin chuck; and a vibration generation part which is installed on the spin chuck to activate the developer deposited on the wafer by vibrating the spin chuck.