发明名称 LEWIS BASE ADDUCTS OF ANHYDROUS MONONUCLEAR TRIS(BETA-DIKETONATE) BISMUTH COMPOSITIONS FOR DEPOSITION OF BISMUTH-CONTAINING FILMS, AND METHOD OF MAKING THE SAME
摘要 Anhydrous mononuclear Lewis base adducted tris( beta -diketonato) bismuth complexes, useful as precursors for chemical vapor deposition of bismuth, for producing Bi-containing films of significantly improved stoichiometry, morphology and functional character, as compared to films obtained from dinuclear tris( beta -diketonato) bismuth complexes of the prior art.
申请公布号 WO0040588(A1) 申请公布日期 2000.07.13
申请号 WO1999US23034 申请日期 1999.10.04
申请人 ADVANCED TECHNOLOGY MATERIALS, INC. 发明人 BAUM, THOMAS;DUBOIS, RAYMOND, H.
分类号 C07C49/92;C07F9/94;C23C16/18;C23C16/40;H01L21/316;(IPC1-7):C07F9/94 主分类号 C07C49/92
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