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发明名称
APPARATUS FOR SPUTTERING IONIZED MATERIAL IN A MEDIUM TO HIGH DENSITY PLASMA
摘要
申请公布号
EP1016119(A1)
申请公布日期
2000.07.05
申请号
EP19980947061
申请日期
1998.09.15
申请人
APPLIED MATERIALS, INC.
发明人
LEET, MICHAEL;FORSTER, JOHN, C.
分类号
H01J37/32;H01J37/34;(IPC1-7):H01J37/32
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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