发明名称 PROCESSING CHAMBER FURNISHED WITH EVACUATING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a processing chamber furnished with a evacuating system, in which the flowing-in of a gas such as the air into the processing chamber is prevented, when a high vacuum probe is removed. SOLUTION: In the installing mechanism 52 of the high vacuum probe 18 of this processing chamber, the high vacuum probe 18 is installed to a processing chamber main body, through an installing piping 56 which is connected to the high vacuum probe at its front end, connected to the processing chamber main body 11 at its base end, and has the third switching valve 54 on the way. The installing piping 56 is connected to the second vacuum pump 62 using a dry pump, through a vacuum suction pipe 60 which has the fourth switching valve 58 on the way. Furthermore, a gas leading-in pipe 68 which has an air leading-in port 64 used for gas connecting port concurrently to connect to a dry nitrogen gas source at the base end, and furnishing the fifth switching valve 66 on the way of the pipe, joins to an installing piping between the high vacuum probe and the third switching valve 54.
申请公布号 JP2000161215(A) 申请公布日期 2000.06.13
申请号 JP19980341693 申请日期 1998.12.01
申请人 SONY CORP 发明人 KOUKADO KENJI
分类号 F04B37/16;(IPC1-7):F04B37/16 主分类号 F04B37/16
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