发明名称 DEPOSITED FILM FORMING DEVICE AND METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To dissolve abnormal electric discharges in a very short period by a method, wherein the prescribed quantity of raw gas is introduced in pulse form, interlocking with the detecting means of abnormal electric discharge generated in plasma. SOLUTION: An abnormal discharge detector 1113 which monitors the state of discharge of plasma is connected in parallel with a bias power source 1114 to a bias power application electrode 1105 through a low-pass filter 1112. When the abnormal discharge detector 1113 detects abnormal state of the plasma discharge such as sparks, etc., a signal is quickly sent to a pulse-like gas feeding system 1115. With this signal sent from the abnormal discharge detector 1113, the air cooling valve of the pulse-like gas feeding system 1115 is made to operate. A fixed quantity of pulse-like gas is instantaneously introduced into a vacuum container 1101. As a result, plasma is maintained in a stable state for a long period, and the yield of production of a deposited film and a throughput can be improved sharply.
申请公布号 JP2000133596(A) 申请公布日期 2000.05.12
申请号 JP19980301491 申请日期 1998.10.22
申请人 CANON INC 发明人 KODA YUZO;FUJIOKA YASUSHI;SAKAI AKIRA;OKABE SHOTARO;SAWAYAMA TADASHI;YAJIMA TAKAHIRO;KANAI MASAHIRO
分类号 H01L21/205;H01L21/31;H05H1/46 主分类号 H01L21/205
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