发明名称 DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a deposition apparatus which is compact and is easy in maintenance. SOLUTION: A loading chamber 1 and an unloading chamber 7, a heating chamber 3 and a third deposition chamber 6 as well as a first deposition chamber 4 and a second deposition chamber 5 are respectively disposed back to back as one set. These three sets are arranged continuously in series. A vacuum rotary chamber 10 is connected via a gate valve 2 to the first deposition chamber 4 and second deposition chamber 5 which are one end of the row. Substrates 8 for deposition held on holders 9 are transported from the first deposition chamber 4 to the rotary chamber 10, are rotated 180 deg. in the transportation direction and are carried into the second deposition chamber 5.
申请公布号 JP2000129442(A) 申请公布日期 2000.05.09
申请号 JP19980308546 申请日期 1998.10.29
申请人 SHARP CORP 发明人 FUTAGAWA MASAYASU
分类号 H01L21/677;C23C14/56;H01L21/68;(IPC1-7):C23C14/56 主分类号 H01L21/677
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