ANALYTICAL METHOD FOR X-RAY REFLECTANCE PROFILE OF METAL MULTILAYER FILM, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide such a new analytical method for the X-ray reflectance profile of a metal multilayer film, that is effective in evaluating the structure of the metal multilayer film which is used for a magnetic head or the like. SOLUTION: Initial values of film thicknesses of respective layers used to analyze the X-ray reflectance profile of a metal multilayer film are designated as t1i to t3i, and the film thicknesses of the respective layers which are found by a fluorescent X-ray measurement are used. As the initial values t1i to t3i, it is favorable to adopt values which are calculated in such a way that stuck amounts F1 to F3 of the respective layers obtained by the fluorescent X-ray measurement are divided by theoretical densitiesρ1i toρ3i of materials for the respective layers.