发明名称 INSULATED CHANNEL FIELD EFFECT TRANSISTOR WITH AN ELECTRIC FIELD TERMINAL REGION
摘要 In one embodiment, the invention includes a field effect transistor having a substrate (54), a source (S1), and a drain (D1). An electric field terminal region (52) is in the substrate. A body (64) is above the electric field terminal region between the source and drain. There is a barrier (58) between the electric field terminal region and the body. In a similar embodiment, the invention includes a field effect transistor having an insulator layer (58) and a body above the insulator layer between a source and a drain. A substrate is below the insulator layer. A gate (G1) is above the body and between the source and drain. An electric field terminal region is included in the substrate. The body may be undoped and the threshold voltage be set by setting the distance between the insulator layer and a gate insulator. The body, substrate, and electric field terminal region may float or one or more of them may be biased.
申请公布号 WO0021137(A1) 申请公布日期 2000.04.13
申请号 WO1999US21540 申请日期 1999.09.16
申请人 INTEL CORPORATION;KESHAVARZI, ALI;DE, VIVEK, K.;NARENDRA, SIVA, G. 发明人 KESHAVARZI, ALI;DE, VIVEK, K.;NARENDRA, SIVA, G.
分类号 H01L29/786;(IPC1-7):H01L27/01;H01L27/12;H01L31/039;H01L29/76;H01L29/788 主分类号 H01L29/786
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