| 摘要 |
<p>Disclosed is an antimicrobial composition containing about 0.1 to about 8.0 percent by weight of 2,4,4'-trichloro-2'-hydroxydiphenyl ether; about 0.1 to about 8.0 percent by weight of 4-chloro-3,5-dimethyl phenol; and about 0.025 to about 5.0 percent by weight of glutaraldehyde; wherein the composition provides antimicrobial properties to a handwash composition equivalent or superior to the antimicrobial properties of 50 ppm of available chlorine and has a pH from about 5.0 to about 11.0. Additionally disclosed is an antimicrobial composition additionally containing about 0.025 to about 8.0 percent by weight of a compound having structure (I) or a salt thereof wherein Rx is (II), x is 0-5, preferably 1-3; and a and b are independently 0, 1 or 2, provided that 2≤a+b≤3. Also disclosed is a method of cleaning skin using these antimicrobial compositions.</p> |
