| 摘要 |
In a method of detecting a position of a position detection grating mark formed with a small step structure on a surface of a flat object, an illumination light beam is irradiated on the grating mark at a predetermined incident angle. The illumination light beam includes a plurality of coherent beams having n (n>/=3) different wavelengths lambda 1, lambda 2, lambda 3, . . . , lambda n. The n wavelengths are set to approximately satisfy the following relation within a range of about +/-10%:(1/ lambda 1-1/ lambda 2)=(1/ lambda 2-1/ lambda 3)= . . . =(1/ lambda n-1-1/ lambda n)where the wavelengths have a condition lambda 1< lambda 2< lambda 3 . . . < lambda n. Photoelectric detection of change in light amount of a diffracted light component generated from the grating mark in a specific direction is performed upon irradiation of the illumination light beam having the n wavelength components. The position of the grating mark is determined based on a signal obtained in the photoelectric detection. A position detection apparatus using the above method and an exposure apparatus using this position detection apparatus are also disclosed.
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