| 摘要 |
PROBLEM TO BE SOLVED: To improve a throughput of an aligner. SOLUTION: A plate carrier PC1, containing a glass plate PT carried to an exposure processing section PE, is received in a subchamber SC separately from a main chamber MC receiving an exposure processing section PE transferring a reticle pattern to a glass plate PT by almost shielding from outside air. A chamber controller controls the environmental condition in the subchamber SC, especially its temperature, to set the temperature of the glass plate PT in the plate carrier PC1 to a predetermined value. The capability of setting temperature of the glass plate PT before being transferred to the exposure processing section to an optimum temperature, that is, almost equal temperature of a plate stage PS temperature makes it possible to immediately start the exposure operation on the glass plate in the exposure processing section.
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