发明名称 Process for manufacturing microstructure
摘要 A microstructure comprising a substrate (1), a patterned structure (beam member) (2) suspended over the substrate (1) with an air-space (4) therebetween and supporting structure (3) for suspending the patterned structure (2) over the substrate (1). The microstructure is prepared by using a sacrificial layer (7) which is removed to form the space between the substrate (1) and the patterned structure (2) adhered to the sacrificial layer. In the case of using resin as the material of the sacrificial layer, the sacrificial layer can be removed without causing sticking, and an electrode can be provided on the patterned structure. The microstructure can have application as electrostatic actuator, etc., depending on choice of shape and composition.
申请公布号 US6020215(A) 申请公布日期 2000.02.01
申请号 US19970844971 申请日期 1997.04.28
申请人 CANON KABUSHIKI KAISHA 发明人 YAGI, TAKAYUKI;AKAIKE, MASATAKE
分类号 B81B3/00;B81C1/00;G03F7/00;H01H59/00;H01L23/00;H02N1/00;H02N2/00;H02N2/02;(IPC1-7):H01L21/311 主分类号 B81B3/00
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