发明名称 PROJECTION DEVICE FOR LITHOGRAPH
摘要 PROBLEM TO BE SOLVED: To copy a fine pattern with considerably high position precision by controlling the instantaneous position of a mask table with a position error signal being the difference of the instantaneous position of a substrate table and a setting point. SOLUTION: The instantaneous position of a mask table 5 against a fixed reference point is measured, and the instantaneous position of a substrate table 1 against a fixed reference point is measured. The measured instantaneous position of the substrate table 1 is compared with the desired instantaneous position of the substrate table l and a position error signal on the difference of the two positions is obtained. Thus, the difference between the instantaneous position of the substrate table 1 and the desired instantaneous position is compensated by controlling the instantaneous position of the mask table 5 based on the position error signal. Thus, the disturbance of the mask table 5, which is viewed from the substrate table l, can considerably be reduced. Thus, a fine pattern can be copied with considerably high position precision.
申请公布号 JP2000031049(A) 申请公布日期 2000.01.28
申请号 JP19990174686 申请日期 1999.06.21
申请人 ASM LITHOGRAPHY BV 发明人 BUTLER HANS;WARMERDAM THOMAS PETRUS H
分类号 H01L21/027;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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