| 摘要 |
PURPOSE: A mark pattern for lithography is provided to increase a contact area between an inner box and a lower layer so that the inner box can be prevented from being detached. CONSTITUTION: A color pattern, or a predetermined pattern such as a contact hole pattern is formed on a lower layer(100 ), and an inner box(110 ) is deposited on a lower layer(100 ), so that a contact area between a lower layer(100 ) and an inner box(110 ) can be increased, thereby preventing an inner box(110 ) from being detached.
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