METHOD FOR FORMING A PHASE SHIFTING MASK

摘要

PURPOSE: A method for forming a phase shifting mask is provided to produce a phase shifter of the phase shifting mask for securing an evenness in phase difference. CONSTITUTION: A method for forming a phase shifting mask comprises: forming a binary mask pattern(12); depositing successively an insulating film(14) and a first resist film(16) on the top surface of a mask substrate; patterning the first resist film and the insulating film successively deposited; spraying a second resist film(18) on the whole surface of the insulating pattern and the binary mask pattern; patterning the second resist film for exposing the surface of the mask substrate; forming a phase shifter(S) composed of an etching stopping film connected to the insulating pattern; and eliminating the second resist film.