MASK FOR EXPOSURE AND ITS PRODUCTION

摘要

PROBLEM TO BE SOLVED: To provide a mask for exposure which can be easily manufactured, and a process for producing the same. SOLUTION: The mask for exposure for forming circuit patterns formed by disposing the light shielding film on a transparent substrate is the mask for exposure characterized in that the mask has the physical development nuclei on the transparent substrate and the light shielding film is the silver film which is obtd. by dissolution of a silver halide and is subjected to image receiving by physical development nuclei at the time of development. Further, this process for producing the mask for exposure consists in forming a photosensitive layer contg. a silver halide emulsion on the transparent substrate having physical development nuclei and developing the silver halide in photoirradiated parts in the photosensitive layer and simultaneously dissolving the silver halide in the un-photoirradiated parts, executing image reception in the physical development nucleus portions at the time of development to form the silver film and removing the photosensitive layer. The physical development nuclei described above are held on the transparent substrate by a metal oxide and org metal compd.