发明名称 INDIRECT ENDPOINT DETECTION BY CHEMICAL REACTION AND CHEMILUMINESCENCE
摘要 <p>Detection of the endpoint for removal of a target film overlying a stopping film by removing the target film with a process that selectively generates a chemical reaction product (312) (ammonia is a reaction product, when polishing a wafer with a nitride film in a slurry containing KOH) with one of the stopping film and the target film, converting the chemical reaction product to a separate product with the help of a converter (400), producing excited molecules from the separate product, detecting the level of light emitted from the flow of the excited molecules (402) passing through a chemiluminescence detector (404) and a very sensitive PMT (410) as the target film is removed.</p>
申请公布号 WO9956972(A1) 申请公布日期 1999.11.11
申请号 WO1999US10045 申请日期 1999.05.06
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LI, LEPING;GILHOOLY, JAMES, ALBERT;MORGAN, CLIFFORD, OWEN, III;SUROVIC, WILLIAM, JOSEPH;WEI, CONG
分类号 B24B37/013;B24B49/12;G01N21/76;H01L21/306;(IPC1-7):B44C1/22;B24B49/00 主分类号 B24B37/013
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