| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for easily forming a hard protective film capable of preventing the charge of static electricity while maintaining low film defects, a thermal head produced by using the target and to provide a method for producing it. SOLUTION: In a thermal head provided with a supporting substrate 3, an exothermic resistor 4 formed on the supporting substrate, an electrode layer 5 connected onto the exothermic resistor and a protective layer 6 formed so as to cover at least the exothermic part of the exothermic resistor, the protective layer 6 is formed by using a sputtering target. It is desirable that the protective layer is provided at least with a primary protective layer which is brought into contact with the exothermic resistor and a secondary protective layer formed on the primary protective layer, the concn. of oxygen in the primary protective layer is 20 to 50 atm.% and the concn. of oxygen in the secondary protective layer is 5 to 30 atm.%. |
