PHOTOMASK, MANUFACTURE THEREOF, EXPOSURE METHOD AND MANUFACTURE OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

摘要

PROBLEM TO BE SOLVED: To enhance the resolution of a pattern and the depth of focus by exposure processing using a photomask having a function giving phase difference to transmitted light. SOLUTION: This photomask is provided with aperture areas 7a repeatedly arranged at light shielding films 7, semi-transparent films 6 which are formed by projecting as much as prescribed width so as to frame the inside circumferences of the respective areas 7a and which invert the phase of the light in the light transmitted through the respective areas 7a and a transparent film 8 mutually inverting the phase of the light respectively transmitted through the mutually adjacent areas 7a.