发明名称 DEVICE FOR CUTTING SEMICONDUCTOR WAFER AND METHOD THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a device and method for cutting a semiconductor wafer in a simple operation for maintaining high vacuum, and for realizing highly accurate cleavage. SOLUTION: A cutting device is provided with interposing members 11 and 12 for interposing the both edge part sides of a semiconductor wafer W from the scheduled cut surface, bearings 15 and 16 for supporting the interposing members 11 and 12 so that angular displacement can be attained freely around axes separated in a prescribed distance at both sides from the scheduled cut surfaces, and electromagnetic holder 20 for positioning the interposing members 11 and 12 in a state such that the semiconductor wafer W is interposed. The interposing members 11 and 12 are released by the electromagnetic holder 20 and bending moment due to the own weight of the interposing members 11 and 12 which acts on the wafer W, so that the wafer W can be cleaved on the scheduled cut surface.</p>
申请公布号 JPH11219921(A) 申请公布日期 1999.08.10
申请号 JP19980019931 申请日期 1998.01.30
申请人 MITSUI CHEM INC 发明人 YAMADA YOSHIKAZU;TAKAGI SHUSAKU
分类号 H01S5/00;B23Q5/00;H01L21/301;H01L21/304;(IPC1-7):H01L21/304;H01S3/18 主分类号 H01S5/00
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