| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask pattern drawing check apparatus constituted to rapidly and surely execute the drawing check of the identity of two mask patterns. SOLUTION: The mask pattern drawing check apparatus 30 has a pattern input section 32 which is inputted with the pattern data of the two mask patterns to be compared and the pattern data of these different patterns and stores the data and a block division section 34 which divides the different patterns to grating-like block units and forms a data base by attaching addresses to the respective units. Further, the apparatus has an extraction means which extracts the blocks having the different patterns and a management information extraction section 36 which has data base forming means for forming the data base of the pattern data by each of the blocks. The apparatus has also a pattern display section 40 which has the function to display, in enlargement, the pattern information of the extracted block and a management information control section 38 which has the function to successively displaying the different patterns of the extracted block in the ascending order or descending order of the numbers of the addresses on a pattern display section 40. |
