| 摘要 |
The illuminance of illumination light from an exposure light source is switched over in a plurality of steps in an open loop control, whereby, when a plurality of shot areas on one substrate to be exposed to light are exposed to the light with various integrated exposure quantities, the exposure quantity with respect to each shot area is correctly controlled. Pulse illumination light from an excimer laser light source is attenuated by a rough energy adjuster and a fine energy adjuster and then illuminates a reticle, while the reticle and a wafer are scanned with respect to a projection optical system, such that a pattern of the reticle is successively transferred to individual shot areas on the wafer. When the extinction ratio of the rough energy adjuster is switched over in an open loop control, the illuminance on the image surface is measured by an illuminance fluctuation sensor so as to adjust, based on the result of this measurement, the illuminance on the image surface.
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