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发明名称
VERFAHREN ZUR PHOTOLITHOGRAPHISCHEN STRUKTURERZEUGUNG
摘要
申请公布号
DE59602090(D1)
申请公布日期
1999.07.08
申请号
DE19965002090
申请日期
1996.01.29
申请人
SIEMENS AG, 80333 MUENCHEN, DE
发明人
LEUSCHNER, RAINER, D-91085 WEISENDORF, DE;GUENTHER, EWALD, D-91074 HERZOGENAURACH, DE;HAMMERSCHMIDT, ALBERT, D-91056 ERLANGEN, DE;FALK, GERTRUD, D-91056 ERLANGEN, DE
分类号
G03F7/09;G03F7/20;G03F7/26;(IPC1-7):G03F7/20
主分类号
G03F7/09
代理机构
代理人
主权项
地址
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