| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a photomask writing system capable of attaining optimum dimensional accuracy in a stage where a photomask is used by deciding a scale value considering the difference of temperature and humidity between environment where the photomask is written and environment where the photomask is actually used. SOLUTION: Attribute information showing a used stage is added to writing data registered in a data input part 1. The temperature and the humidity in a writing chamber and the stage where the photomask is used are read from a parameter storage part 7 so as to calculate an optimum scale factor in a scale factor arithmetic operation part 2. Furthermore, the writing data is multiplied by the scale factor calculated in the arithmetic operation part 2 by a writing data scale correction part 3. The writing data is converted in terms of format by a data processing part 4 and supplied to a writing mechanical control part 5. Under the control of the control part 5, the photomask having the optimum dimension accuracy is written by a writing machine part 6.</p> |
