| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist compsn. capable of preventing the residue of a developer from being generated and having high resolving power by incorporating a specified alkali-soluble resin binder, a non-polymer dissolution inhibiting compd. having a specified functional group, a compd. which generates an acid by irradiating active light beams or radiation and a solvent. SOLUTION: A photoresist compsn. contains a resin obtd. by substituting groups represented by formula for 10-80% of phenolic hydroxyl groups in an alkali-soluble resin contg. the phenolic hydroxyl group, a non-polymer type dissolution inhibiting compd. having a group selected from among tert. alkyl ester groups and tert. alkyl carbonate groups and increasing solubility in an aq. alkali soln. by the action of an acid, a compd. which generates the acid by irradiating active light beams or radiation and a solvent. In the formula, R<1> is a substituent selected from 1-4C alkyl groups, W is an atomic group selected from among an org. group contg. at least one of O, N, S, P and Si atoms, an amino, ammonium or mercapto group and (n) is a natural number of 1-4. |
