THERMAL TREATMENT OF A SEMICONDUCTOR WAFER,申请号KR19940070637-传众专利搜索

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发明名称	THERMAL TREATMENT OF A SEMICONDUCTOR WAFER
摘要
申请公布号	KR0181532(B1)	申请公布日期	1999.04.15
申请号	KR19940070637	申请日期	1994.02.26
申请人	SUMITOMO SITIX CORP.	发明人	HORAL, MASATAKA;ADACHI, NAOSHI;NISHIKAWA, HIDESHI;SANO, MASAKAZU
分类号	H01L21/02;H01L21/205;H01L21/30;H01L21/322;H01L21/324;(IPC1-7):H01L21/322	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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