| 摘要 |
<p>A liquid delivery system (110) dispensing a liquid (114) for subsequent processing. The liquid delivery system in one embodiment comprises a pressurizable reservoir (112) for holding a liquid (114), a pressurizing gas source (118) coupled with the reservoir (112) and constructed and arranged to selectively impose a pressure on liquid (114) therein to effect discharge of liquid (114) from the reservoir (112), and a liquid mass flow controller (150) joined in liquid flow relationship to the reservoir (112) for receiving the liquid (114) discharged therefrom, and for dispensing the liquid (114) after flowing through the mass flow controller (150), as a flow-controlled liquid stream. The flow-controlled liquid stream may for example be a precursor liquid reagent for a vapor deposition process, which is vaporized subsequent to dispensing to form a reagent source vapor for chemical vapor deposition (CVD) or other vapor deposition process.</p> |
