| 摘要 |
PROBLEM TO BE SOLVED: To eliminate the need for taking-out of exposed wafers, stripping of resist from any wafer and re-application of resist to any wafer, by acquiring data on the state of processing of substrates in a housing means according to identification information, and sequentially updating data on the state of processing as the substrates in the housing means are subjected to exposure according to the data on the state of the processing. SOLUTION: The identification(ID) of a wafer cassette 11 to be processed is input to a controller 14. The controller 14 acquires information of whether each wafer corresponding to the ID of the cassette 11 has been exposed or not, through a network 16 according to the input ID of the cassette 11. When exposure is started, the controller 14 selects information on the first wafer from the acquired information, and judges whether the wafer has not been exposed. When the controller judges that the wafer has been already exposed, it performs exposure, and updates the information on the exposed wafer reflecting the fact that the wafer has been already exposed. If there is any wafer in the cassette 11 that has not been subjected to judgment thereafter, the controller selects information on the next wafer. The above-mentioned operation is repeated, and the exposure system 12 is so controlled that wafers other than exposed ones are exposed. |
