| 摘要 |
According to a method and an apparatus for determining absolute plasma parameters in unsymmetrical radio frequency (RF) low-pressure plasmas, a radio frequency discharge current generated in a plasma reactor is measured in the form of analog signals at a portion of the reactor acting as earth electrode, the analog signals are converted into digital signals, and the desired plasma parameters are evaluated from the digital signals by means of a mathematical algorithm. The apparatus includes a meter electrode which is insulatedly positioned in a flange or recess of the reactor wall which acts at least as part of the earth electrode. The method and apparatus may be used with respect to plasma etching in the technical field of the semiconductor technology.
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