发明名称 |
Drip chemical delivery apparatus |
摘要 |
A drip chemical delivery system used in semiconductor substrate cleaning processes. A drip chemical delivery system which uses small openings in a pipe (holes) and a low air pressure to saturate the brushes in a double sided brush system. This drip delivery system reduces the volumes of chemical solutions used in a scrubbing process and helps to maintain control of the pH profile of a substrate. This system is described and illustrated in the manner it is used in conjunction with a double sided scrubber.
|
申请公布号 |
US5853522(A) |
申请公布日期 |
1998.12.29 |
申请号 |
US19960688257 |
申请日期 |
1996.07.29 |
申请人 |
ONTRAK SYSTEMS, INCORPORATED |
发明人 |
KRUSELL, WILBUR C.;LARSON, LANE L. |
分类号 |
B08B7/00;H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
B08B7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|