发明名称 CO-ROTATING EDGE RING EXTENSION FOR USE IN A SEMICONDUCTOR PROCESSING CHAMBER
摘要 <p>An apparatus to isolate a rotating frame in a processing chamber, comprising: a support cylinder rotatably extending from the rotating frame; and a co-rotating edge ring extension extending from the support cylinder to at least one of substantially thermally, optically and mechanically isolate the region above the co-rotating edge ring extension from the region below the co-rotating edge ring extension.</p>
申请公布号 WO1998051844(A1) 申请公布日期 1998.11.19
申请号 US1998010143 申请日期 1998.05.12
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