| 摘要 |
PROBLEM TO BE SOLVED: To provide the photosensitive resin composition having adaptability to a ball pen and yet, superior in developability and resistance to printing. SOLUTION: This photosensitive resin composition is provided on a support with >=2 layers including a photosensitive composition layer containing a compound to be allowed to release an acid or a radical by irradiation with light, activated radiation, or electron beams on a support, and a ratio (A) of m-cresol/(m-cresol + p-cresol) of the novolak resin in the uppermost photosensitive layer and the similar ratio (B) of at least one of the photosensitive layers except the uppermost one have the following interrelation: 100>=B-A>0.1, and at least one of the photosensitive layers contains a polyisocyanate compound or at least one of the layers contains an organic acid or its acid anhydride. |
