| 摘要 |
PROBLEM TO BE SOLVED: To decrease the number of reticles by exposing a first pattern of a reticle to one end part of a semiconductor chip, exposing two or more second patterns to the central part of the chip in a specified direction contiguously to the first pattern and then exposing a third pattern to the other end part of the chip contiguously to the second pattern. SOLUTION: Three patterns A, B and C are formed on a reticle 5 and used for exposing a pattern A in region R1 on a chip 1, three patterns B in region R2 shifted vertically from the region R1 and a pattern C in region R3. At the time of exposing each pattern, other regions are shielded by a reticle blind. Since the chip 1 is larger than the maximum exposing region, the semiconductor chip 1 can be exposed using a single reticle 5 by taking advantage of the properties where a memory cell array, and the like, repeat an identical pattern in the vertical direction and thereby the number of reticles can be decreased. |
