Verfahren zum Reinigen einer Oberfläche und Reinigungssystem

摘要

Disclosed is a cleaning system for surface cleaning, comprising a cleaning tool (2) with a working area (A) and a UV light source (7) whose UV radiation exits from the tool (2) in the working area (A), and a cleaning agent containing a photoactivable semiconductor material (3), wherein UV radiation is coupled directly into the photoactivable semiconductor material (3) in the working area (A) via a light guiding device.