Dust removing apparatus and dust removing method

摘要

A dust removing apparatus equipped with a back washing mechanism and a dust removing method for removing solid silica fine powdeer contained in a gas discharged from a semiconductor producing step of a single wafer processing atmospheric pressure PVD apparatus without causing troubles by the increase of a pressure loss and by a pressure fluctuation, wherein filter elements each having a ratio of an area of a primary side of a filter membrane to an apparent external area of the filter element of from 1 to 5 is used, gas jetting nozzle(s) for back washing is formed in the secondary side of the filter element, back washing is not carried out during filtration in the filter element and at or after changing processing of a wafer in the CVD apparatus, back washing is carried out to blown down the silica fine powder accumulated on the filter membrane of the primary side.