首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
ANLAGE ZUM TRANSPORTIEREN VON GLEISJOCHEN
摘要
申请公布号
AT166681(T)
申请公布日期
1998.06.15
申请号
AT19950890074T
申请日期
1995.04.06
申请人
FRANZ PLASSER BAHNBAUMASCHINEN- INDUSTRIEGESELLSCHAFT M.B.H.
发明人
THEURER, JOSEF, ING.;BRUNNINGER, MANFRED
分类号
B61D3/08;B61D3/10;B61D3/16;B61D15/00;B61G5/02;E01B29/02;E01B29/05;E01B29/17;(IPC1-7):E01B29/02
主分类号
B61D3/08
代理机构
代理人
主权项
地址
您可能感兴趣的专利
INTERCONNECTION BOARD
DIRECT THERMOELECTRIC TRANSDUCER AND MANUFACTURE OF ITS COMPONENT ELEMENT
INFRARED AVALANCHE PHOTODIODE
SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
HYBRID INTEGRATED CIRCUIT AND ITS FABRICATING METHOD
METHOD AND ROLLER FOR APPLYING HEAT TRANSFER MEDIUM
ANODE SIDE SHORT-CIRCUIT STRUCTURE FOR ASYMMETRICAL THYRISTOR
PACKAGE OF SEMICONDUCTOR SENSOR
MANUFACTURE OF SEMICONDUCTOR DEVICE
RADIATION STRUCTURE OF SEMICONDUCTOR ELEMENT
TEMPERATURE CONTROLLER FOR SEMICONDUCTOR LASER
SEMICONDUCTOR LASER INTERNAL RESONANCE TYPE SHG LIGHT SOURCE
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
PACKAGING STRUCTURE OF SEMICONDUCTOR DEVICE
SUBSTRATE FOR MOUNTING SEMICONDUCTOR CHIP
SEMICONDUCTOR DEVICE
METHOD AND APPARATUS FOR APPLYING RESIN TO SLIT SECTION OF BENT TAB TAPE
SILICON WAFER AND ITS THERMAL TREATMENT METHOD
SILICON OXIDE FILM FORMING METHOD AND SILICON SUBSTRATE PROVIDED WITH SILICON OXIDE FILM
THIN FILM DRY-ETCHING METHOD
