| 摘要 |
<p>Process to create the coupling in an optoelectronic device between a waveguide defined on the surface of a sub-layer and an optical fiber in order to determine a substantially pre-formed axial alignment in relation to all six possible degrees of freedom of the coupling. The process includes the step of forming an excavation with 'V' grooves of prefixed depth in said sub-layer by means of chemical etch through an opening defined and produced through a layer of material resistant to the solution of chemical etch deposited on the surface of said sub-layer. The definition of said opening includes the further step of pre-forming a definition structure (6d) of the excavation area on the surface of said sub-layer (1), defining it photolithographically simultaneously to said waveguide (6g) by means of a same masking process. The structure of definition is obtained from the same layer (5) as the waveguide (6g).</p> |
