| 摘要 |
PROBLEM TO BE SOLVED: To obtain a polymer compsn. capable of forming an optical pattern having superior thermal stability, a low coefft. of thermal expansion, superior chemical stability, water and solvent resistances, a low dielectric constant, superior mechanical characteristics and adhesiveness and to produce a polymer in the compsn. SOLUTION: This polymer compsn. has a wt. average mol.wt. of about 1,000-100,000 and contains a polymer contg. several monomeric repeating units each having a 1st photosensitivity imparting substituent capable of crosslinking or chain-extending the polymer when the polymer is exposed with chemical rays and also contg. a 2nd heat sensitivity imparting substituent capable of further crosslinking or chain-extending the polymer when the polymer is exposed to about >=140 deg.C. The 1st and 2nd substituents are different from each other and the polymer has a specified structure. |
