发明名称 MANUFACTURE OF BARRIER PLATE
摘要 PROBLEM TO BE SOLVED: To provide a barrier plate that is excellent in resolution and high in dimensional accuracy by forming over a substrate a barrier plate material layer containing an ethylene-unsaturated-group-containing polymer compound and a photosensitive resin composition layer, and sandblasting a hardened film pattern. SOLUTION: A photosensitive resin composition layer 3 containing an ethylene-unsaturated group containing polymeric compound represented by the formula 1 is formed using, e.g. a photosensitive film, over a barrier plate material layer 2 formed over a substrate 1, the thickness of the layer 2 ranging between, e.g. 100 and 300μm. An example of the photosensitive film is a polyethylene terephthalate film 5 to 100μm thick, which is pressed against the substrate 1 while being heated to form a pattern of a hardened film 6 after exposure and development processes. By using the pattern of the hardened film 6 as an etching mask and performing sandblasting to remove the pattern of the hardened film 6, a bulkhead 7 is obtained which is excellent in resolution and sandblasting resistance, is refined, and is high in positional and dimensional accuracies.
申请公布号 JPH1069851(A) 申请公布日期 1998.03.10
申请号 JP19960226577 申请日期 1996.08.28
申请人 HITACHI CHEM CO LTD 发明人 TSUCHIYA KATSUNORI;TANNO SEIKICHI;OTOMO SATOSHI
分类号 G03F7/027;G03F7/028;G03F7/033;G03F7/30;G03F7/40;H01J9/02;(IPC1-7):H01J9/02 主分类号 G03F7/027
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