发明名称 OHMIC ELECTRODE AND FORMING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To stabilize a device for a long time by reducing the specific contact resistruaty and enhance the thermal stability. SOLUTION: An electrode layer 3 is formed on a p-type compd. semiconductor layer 1 made of a p-type GaN, etc., through a contact layer 2 formed by the MBE method so that the hole concn. is higher than that of the semiconductor layer 1. The electrode layer 3 is formed by laminating an Au- or other transition metallic (except Pt) layer 3a, Pt 3b and metal layer 3c and then annealing them. The Pt layer blocks Au from diffusing into the compd. semiconductor layer, and the transition metal layer adheres the Pt layer to the compd. semiconductor layer.
申请公布号 JPH1041254(A) 申请公布日期 1998.02.13
申请号 JP19960213117 申请日期 1996.07.24
申请人 SONY CORP 发明人 MIYAJIMA TAKAO
分类号 H01L21/203;H01L21/28;H01L21/285;H01L29/45;H01L33/32;H01L33/40 主分类号 H01L21/203
代理机构 代理人
主权项
地址