Optical device with substrate and waveguide structure having thermal matching interfaces

摘要

The optical device is produced comprising a doped silica substrate having a coefficient of thermal expansion between 8X10-7 deg. C.-1 and 15X10-7 deg.C.-1. On the doped silica substrate is formed a doped silica waveguiding structure having a coefficient of thermal expansion between 8X10-7 deg. C.-1 and 15X10-7 deg. C.-1. Alternatively, the coefficient of thermal expansion of the doped silica substrate is selected to be approximately 90% to 110% of the coefficient of thermal expansion of the doped silica waveguiding structure.