发明名称 Method of synthetic diamond ablation with an oxygen plasma and synthetic diamonds etched accordingly
摘要 A method for ablating a synthetic diamond having a pitted surface includes applying a colloidal graphite to the surface of the diamond and subjecting it to an oxygen plasma so that preferably approximately 50 microns are removed from the surface of the synthetic diamond. The resulting surface of the diamond is virtually pit free. Preferably, the diamond is then mechanically lapped for finishing.
申请公布号 US5711698(A) 申请公布日期 1998.01.27
申请号 US19950437102 申请日期 1995.05.05
申请人 SAINT-GOBAIN/NORTON INDUSTRIAL CERAMICS CORP 发明人 CHAKRABORTY, RABINDRA N.;FERRECCHIA, MICHAEL J.;GOLDMAN, PAUL D.;REINHARD, DONNIE K.
分类号 B01J19/08;C04B41/00;C04B41/53;C04B41/80;C04B41/91;C30B29/04;C30B33/00;H01L21/3065;(IPC1-7):B24B1/00 主分类号 B01J19/08
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