发明名称 ACTIVE MATRIX MASK SUBSTRATE AND ITS PRODUCTION
摘要 <p>PROBLEM TO BE SOLVED: To manufacture a liquid crystal display device having a high opening rate and good orientation of liquid crystals at a good yield by decreased production stages. SOLUTION: This liquid crystal display device is provided with gate signal lines 2, source signal lines 12 and interlayer insulating films of a two-layered structure so as to cover TFTs. The first layer 18a on the substrate side of these interlayer insulating films consist of a benzocyclobutene layer and the second layer 18b consists of a silicon oxide layer obtd. by subjecting the surface of the first layer 18a to an oxygen plasma treatment. The interlayer insulating films are provided thereon with pixel electrodes 11 which are connected to switching elements via contact holes penetrating the interlayer insulating films.</p>
申请公布号 JPH09325330(A) 申请公布日期 1997.12.16
申请号 JP19960140528 申请日期 1996.06.03
申请人 SHARP CORP 发明人 SHIMADA YOSHIHIRO
分类号 G02F1/1333;G02F1/136;G02F1/1362;G02F1/1368;(IPC1-7):G02F1/133 主分类号 G02F1/1333
代理机构 代理人
主权项
地址