| 摘要 |
PURPOSE:To obtain resist characteristics superior in sensitivity, resolution, etching resistance, and storage stability by incorporating a specified polyhalophenol compound to be allowed to produce acid by irradiation with active rays. CONSTITUTION:The resist composition comprises the alkali-soluble phenol resin, the compound to be allowed to produce acid by irradiation with the active rays, and a compound capable of cross-linking in the presence of acids, and this compound is the polyhalophenol compound selected from the group consisting of the compound represented by one of forumlae I and II and the like. In formulae I and II, each of R1-R8 is halogen, H, or the like. It is preferable that the halogen atoms of this polyhalophenol compound combined with the aromatic ring are bromine or chlorine atoms, and the compound capable of cross-linking in the presence of acid is compound having a C-O-R (R is H or alkyl) group or an epoxy group. |
