Sputter target production method

摘要

The method produces a target with a back plate (3) and cooling elements (4) for a sputter cathode of a vacuum coating installation. The method includes several steps: (a) the back plate is provided with parallel grooves (6) and (7, 8); (b) a tightly fitting U-profile (4) is inserted into the groove (6); and (c) the resultant channel (14) is filled with an inert gas, and the legs (10, 11) of the U-profile are joined by TIG welding to the protruding pieces (5, 5') formed by the grooves (7, 8). Next (d) a frame is attached to the back plate on the side opposite to the side with U-profiles to form a tray with raised edges; and (e) this tray is filled with a cast sputter material (9), preferably tin. Also claimed is an alternative method for target production.