| 发明名称 |
Wafer spacing mask for a substrate support chuck and method of fabricating same |
| 摘要 |
<p>An apparatus for supporting a workpiece (116) spaced from a support surface (102) of a support chuck (104) comprises a spacing mask (100) made of metal on the support surface. Also claimed is a method of making a wafer spacing mask comprising depositing a metallic material in a pre-defined pattern over a support surface of the chuck support member.</p> |
| 申请公布号 |
EP0794566(A1) |
申请公布日期 |
1997.09.10 |
| 申请号 |
EP19970301502 |
申请日期 |
1997.03.06 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BURKHART, VINCENT E.;SUGARMAN, MICHAEL N.;GRUNES, HOWARD E. |
| 分类号 |
H02N13/00;B23Q3/15;H01L21/683;(IPC1-7):H01L21/68;H01L21/00 |
主分类号 |
H02N13/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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