| 摘要 |
A bunion treatment apparatus for minimizing forces applied to a bunion on a foot surface of a patient includes a generally planar main portion and at least a first generally planar build-up portion. Both portions are constructed of flexible padding material and have predetermined thicknesses. The build-up portion has a smaller planform area than the main portion. The main portion is provided with a bunion-receiving aperture, which preferably extends therethrough, and the build-up portion is sized and shaped to fit around the bunion-receiving aperture. By providing one or more build-up portions with the main portion, the podiatric patient can custom-adjust the thickness and configuration of the bunion treatment apparatus to fit his own individual bunion. The main portion is also provided with a toe loop, which is formed with strain relief cutouts where its generally opposed edges intersect, to eliminate tearing of the main portion when the toe loop is placed over the toe of a patient. |
