Verfahren und Vorrichtung zum Strukturieren einer photolithographischen Schicht

摘要

The method proposed for producing features on a photolithographic layer comprises the following steps: a first pattern (100) is generated on a first planar light modulator (302a), the first planar light modulator (302a) having a multiplicity of image elements, the first pattern (100) being defined by a predetermined number of addressed image elements. A second pattern (102) is generated on a second planar light modulator (302b), the second planar light modulator (302b) having a multiplicity of image elements, the second pattern (102) having a first zone (102a) of addressed image elements which corresponds to the first pattern (100) or to part of it plus, immediately adjacent to this first zone, a second zone (102b) of addressed image elements. The first and second patterns (100, 102) are imaged on the area to be exposed (314) on the layer (316) on which the features are to be produced.