发明名称 Nanocrystalline layer thin film capacitors
摘要 The invention relates to a method for forming a high capacitance thin film capacitor comprising forming layers of dielectric material in amorphous, nanocrystalline and polycrystalline configuration and arranging the resulting layers between upper and lower electrodes. The invention further comprises dielectric articles such as capacitors formed in accordance with the method of the invention and includes their use in an electronic circuit.
申请公布号 US5587870(A) 申请公布日期 1996.12.24
申请号 US19940263521 申请日期 1994.06.22
申请人 RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK 发明人 ANDERSON, WAYNE A.;JIA, QUANXI;YI, JUNSIN;CHANG, LIN-HUANG
分类号 H01G4/20;H01L21/02;(IPC1-7):H01G4/10 主分类号 H01G4/20
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