| 摘要 |
PURPOSE: To perform highly precise exposure of a concentric or radial pattern at a high speed by sending converged light beams in a rotation cycle by which the converged light beams overlap each other in the radius direction of a photoresist by the predetermined quantity. CONSTITUTION: An exposing device is constructed of a controlling means consisting of a light source 1 radiating laser light and the like, an optical means by which the light radiated from the light source 1 is modulated so as to be converged onto a photoresist 6, a rotating device 8 rotationally operating a photoresist base board 5, a radius monitor 7 detecting a position of a converged light beam on the photoresist 6, and a signal generator 9 controlling light modulation of the light radiated from the light source 1. When the photoresist 6 is rotated, the converged light beams are sent in a rotation cycle by which the converged light beams overlap each other in the radius direction of the photoresist 6 by the predetermined quantity. In this way, a light beam transmitted through a light modulator 2 is converged by means of a condensing lens 4 so as to focus on the surface of the photoresist 6, and then, rotation type application exposure is carried out. |
